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INDUSTRIAL PURE WATER APPLICATION
Ultrapure water (UPW) for semiconductor industry
In the production of plasma displays, chips and integrated circuits, water of very high quality is necessary for certain process steps.
Typical scheme of a UPW production system
UPW production requires an integration of several treatment technologies including reverse osmosis, electro-deionization and ion exchange.
A well designed UPW system requires a strategic selection of technologies and equipment. Depending on the feed water quality and/or the user requirements, different configurations can be applied.Please contact us for more information.
UPW quality guidelines
The ASTM (American Society for Testing and Materials) differentiate several gradations of purity for the semiconductor industry
|
Parameter |
Type E.1 |
Type E 1.1 |
Type E 1.2 |
|
Linewidth |
1.0-0.5 |
0.35-0.25 |
0.18-0.09 |
|
Resistivity, 25oC MΩ.cm |
18.1 |
18.2 |
18.2 |
|
TOC (μg/L) (on-line for |
5 |
2 |
1 |
|
On-line dissolved oxygen (μg/L) |
25 |
10 |
3 |
|
On-Line Residue after evaporation (μg/L) |
1 |
0.5 |
0.1 |
|
SEM particles |
|
|
|
|
0.1-0.2 µm |
1.000 |
700 |
<250 |
|
0.2-0.5 µm |
500 |
400 |
<100 |
|
0.5-0.1 µm |
100 |
50 |
<30 |
|
10 µm |
<50 |
<30 |
<10 |
|
Bacteria in CFU/Volume |
|
|
|
|
100 mL Sample |
5 |
3 |
1 |
|
1L Sample |
|
|
10 |
|
10L Sample |
|
|
|
|
Silica |
|
|
|
|
Total (μg/L) |
5 |
3 |
1 |
|
Dissolved (μg/L) |
3 |
1 |
0.5 |
|
Anions and Ammonium by IC (μg/L) |
|
|
|
|
Ammonium |
0.1 |
0.1 |
0.05 |
|
Bromide |
0.1 |
0.05 |
0.02 |
|
Chloride |
0.1 |
0.05 |
0.02 |
|
Fluoride |
0.1 |
0.05 |
0.03 |
|
Nitrate |
0.1 |
0.05 |
0.02 |
|
Nitrite |
0.1 |
0.05 |
0.02 |
|
Phosphate |
0.1 |
0.05 |
0.02 |
|
Sulfate |
0.1 |
0.05 |
0.02 |
|
Metals by ICP/MS (μg/L) |
|
|
|
|
Aluminum |
0.05 |
0.02 |
0.005 |
|
Antimony |
|
|
|
|
Arsenic |
|
|
|
|
Barium |
0.05 |
0.02 |
0.01 |
|
Boron |
0.3 |
0.1 |
0.05 |
|
Cadmium |
|
|
|
|
Calcium |
0.05 |
0.02 |
0.002 |
|
Chromium |
0.05 |
0.02 |
0.002 |
|
Copper |
0.05 |
0.02 |
0.002 |
|
Iron |
0.05 |
0.02 |
0.002 |
|
Lead |
0.05 |
0.02 |
0.005 |
|
Lithium |
0.05 |
0.02 |
0.003 |
|
Magnesium |
0.05 |
0.02 |
0.002 |
|
Manganese |
0.05 |
0.02 |
0.002 |
|
Nickel |
0.05 |
0.02 |
0.002 |
|
Potassium |
0.05 |
0.02 |
0.005 |
|
Sodium |
0.05 |
0.02 |
0.005 |
|
Strontium |
0.05 |
0.02 |
0.001 |
|
Tin |
|
|
|
|
Titanium |
|
|
|
|
Vanadium |
|
|
|
|
Zinc |
0.05 |
0.02 |
0.002 |
Note: The values in this table are guidelines provided by ASTM. The guidelines will be revised whenever the semiconductor industry develops new linewidths Please consult ASTM website (www.astm.org) for updates on these values.
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